For several months, I have been discussing the potential implications of a DeepSeek moment in lithography. This perspective has been met with skepticism and ridicule from certain members of the Twitter lithography community. While I am saddened to see my concerns validated, I feel it is necessary to share my insights now that the truth is becoming increasingly apparent.
The United States is gradually coming to terms with the fact that it may be impossible to halt the progress of the Chinese lithography industry. Sanctions have been misapplied, and the industry has achieved what can be described as escape velocity. ASML, a key player in the lithography sector, appears to recognize this reality, as evidenced by its decision to open a service facility in Beijing. This move underscores their need to service older machines to avoid being permanently excluded from the market.
TSMC has been cognizant of these developments for several months, with senior leadership consistently warning about the risks to our competitiveness in mature nodes. The advancements made by Beijing in EUV light generation are particularly noteworthy. The DeepSeek moment in lithography that I previously alluded to may be approaching more rapidly than many anticipate.
I urge those in positions of influence within the U.S. government to take heed of the developments in Beijing. Taiwanese and U.S. officials have been aware for some time that China is developing an EUV mega source known as the High Energy Photon Source (HEEPS). This facility, a storage ring synchrotron particle accelerator, is projected to deliver 1000 times more power than a single ASML High NA machine. The design includes plans to distribute light to multiple semiconductor fabrication plants, akin to how a power plant supplies electricity.
The construction of this facility is expected to be completed soon and is currently a top priority for both the Chinese Communist Party and the Chinese Academy of Sciences.
It is imperative that the United States initiate a comparable effort and classify the development of a high-power EUV light source as a national security priority. We require a Manhattan Project for lithography! The relocation of TSMC's R&D facility and personnel to Arizona is not a coincidence; it marks the initial step towards self-sufficiency in U.S. semiconductor production.
I will be traveling between Taipei and Phoenix in the coming months to assist in leading this initiative and to engage with our stakeholders. I encourage everyone to communicate with your congressional representatives and senators to emphasize the importance of lithography. We must strive to manufacture chips in America that are superior to those produced anywhere else in the world!
Below are images relevant to the discussed developments:
For those interested in verifying the information, here are the coordinates of the HEEPS facility: (40.382808, 116.694682).
I am familiar with the research conducted at HEEPS, having briefly engaged in studies there myself. I believe that the ongoing construction of a new cyclotron is a commendable initiative.
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